Metrology, inspection, and process control for microlithography XI : 10-12 March 1997, Santa Clara, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipmant and Materials International, SEMATECH (Organization)
Other Authors:	Jones, Susan K.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [1997]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 3050.
Subjects:	Integrated circuits > Inspection > Congresses. Integrated circuits > Measurement > Congresses. Integrated circuits > Congresses. Measurement > Congresses.

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