Cover Image

Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumention Engineers, Semiconductor Equipment and Materials International, SEMATECH (Organization)
Other Authors: Tarascon-Auriol, Rʹegine G.
Format: Book
Language:English
Published: Bellingham, Washington : International Society for Optical Engineering, [1997]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3049.
Subjects:
Photoresists > Congresses.
Online Access:https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/3049.toc
Description
Physical Description:xv, 1028 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819424633