16th Annual Symposium on Photomask Technology and Management : proceedings : 18-20 September 1996, Redwood City, California /
| Corporate Authors: | , , |
|---|---|
| Other Authors: | , |
| Format: | Conference Proceeding Book |
| Language: | English |
| Published: |
Bellingham, Wash. :
SPIE,
[1996]
|
| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 2884. |
| Subjects: |
| Physical Description: | x, 586 pages : illustrations ; 28 cm. |
|---|---|
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0819422827 |