16th Annual Symposium on Photomask Technology and Management : proceedings : 18-20 September 1996, Redwood City, California /

Bibliographic Details
Corporate Authors:	Symposium on Photomask Technology and Management Redwood City, Calif., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors:	Shelden, Gilbert V., Reynolds, James A., 1930-
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Wash. : SPIE, [1996]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 2884.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses.

Remote Storage