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Stress-induced phenomena in metallization : third international workshop, Palo Alto, CA June 1995 /

Bibliographic Details
Other Authors: Ho, P. S.
Format: Book
Language:English
Published: New York : American Institute of Physics, [1996]
Series:AIP conference proceedings ; no. 373.
Subjects:
Semiconductors > Defects > Congresses.
Metallic films > Congresses.
Thin film devices > Defects > Congresses.
Aluminum films > Congresses.

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Call Number: TK7871.85 .S765 1996
 
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TK7871.85 .S765 1996 Available