Cover Image

Microlithography and metrology in micromachining II : 14-15 October 1996, Austin, Texas /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, National Institute of Standards and Technology (U.S.)
Other Authors: Postek, Michael T., Friedrich, Craig
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE, [1996]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 2880.
Subjects:
Micromachining > Congresses.
Microlithography > Congresses.
Measurement > Congresses.
Description
Item Description:"Cooperating organizations: Solid State Technology, Sandia National Laboratories."
Physical Description:ix, 296 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819422789
9780819422781