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Microlithography and metrology in micromachining II : 14-15 October 1996, Austin, Texas /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, National Institute of Standards and Technology (U.S.)
Other Authors: Postek, Michael T., Friedrich, Craig
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE, [1996]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 2880.
Subjects:
Micromachining > Congresses.
Microlithography > Congresses.
Measurement > Congresses.

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Holdings details from Remote Storage
Call Number: TJ1191.5 .M525 1996
 
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TJ1191.5 .M525 1996 Available