Cover Image

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SEMATECH
Other Authors: Seeger, David E.
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1996]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 2723.
Subjects:
Integrated circuits > Masks > Congresses.
Lithography, Electron beam > Congresses.
X-ray lithography > Congresses.
Ion beam lithography > Congresses.
Description
Physical Description:vii, 412 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819420999