Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SEMATECH
Other Authors:	Seeger, David E.
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1996]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 2723.
Subjects:	Integrated circuits > Masks > Congresses. Lithography, Electron beam > Congresses. X-ray lithography > Congresses. Ion beam lithography > Congresses.

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