Cover Image

15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California /

Bibliographic Details
Corporate Authors: Symposium on Photomask Technology and Management Santa Clara, Calif., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Sheldon, Gilbert V., Wiley, James N.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1995]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 2621.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
Description
Physical Description:ix, 636 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819419850