15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California /

Bibliographic Details
Corporate Authors:	Symposium on Photomask Technology and Management Santa Clara, Calif., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors:	Sheldon, Gilbert V., Wiley, James N.
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1995]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 2621.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses.

Remote Storage