A conceptual design of a Reactive Ion Etch back end system for the direct reuse of process gases /

(RIE), is a vital tool in manufacturing semiconductor

Bibliographic Details

Main Author:	Tiner, Paul Alan
Format:	Thesis eBook
Language:	English
Published:	[Place of publication not identified] : [publisher not identified] ; 1994.
Subjects:	Major electrical engineering.
Online Access:	Link to OAKTrust copy