Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan /

Bibliographic Details
Corporate Authors:	BACUS (Technical group), Photomask Japan '95
Other Authors:	Yoshihara, H. Hideo
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Wash. : SPIE, [1995]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 2512.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses.

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