Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International
Other Authors:	Warlaumont, John M.
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1995]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 2437.
Subjects:	Lithography, Electron beam > Congresses. X-ray lithography > Congresses. Ion beam lithography > Congresses. Integrated circuits > Masks > Congresses.

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