Cover Image

Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International
Other Authors: Allen, Robert D.
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1995]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 2438.
Subjects:
Photoresistors > Congresses.
Photoresists > Congresses.
Description
Physical Description:xiii, 904 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819417866