Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International
Other Authors:	Allen, Robert D.
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1995]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 2438.
Subjects:	Photoresistors > Congresses. Photoresists > Congresses.

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