Measurement of shallow arsenic profiles in silicon by Rutherford backscattering analysis /

Bibliographic Details
Main Author:	Foster, Lynn Andrew, 1965-
Other Authors:	Parish, Theodore A. (degree committee member.), Reece, Warren D. (degree committee member.), Schweikert, Emile A. (degree committee member.)
Format:	Thesis Book
Language:	English
Published:	1992.
Subjects:	Ion implantation. Silicon. Arsenic > Measurement. Backscattering. Major nuclear engineering. Academic theses
Online Access:	Link to OAKTrust copy

Link to OAKTrust copy

Remote Storage

Holdings details from Remote Storage
Call Number	Status	Get It
Call Number:		1992 Dissertation F755
Notes:		Cushing Archival Copy (Library Use Only)

1992 Dissertation F755	Available