Cover Image

64- to 256-megabit reticle generation : technology requirements and approaches /

Bibliographic Details
Corporate Authors: BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Hearn, Gregory K.
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE Optical Engineering Press, [1994]
Series:Critical reviews of optical science and technology ; v. CR51.
Subjects:
Microlithography > Congresses.
Integrated circuits > Design and construction > Congresses.
Integrated circuits > Masks > Congresses.
Description
Item Description:"Proceedings of a conference held 24 September 1993, Santa Clara, California, sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology."
Physical Description:vii, 273 pages : illustrations ; 27 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819413577 (hardcover) :
0819413585 (softcover) :