Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SPIE Symposium on Microlithography
Other Authors:	Nalamasu, Omkaram, 1958-
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1994]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 2195.
Subjects:	Photoresistors > Congresses. Photoresists > Congresses.

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