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Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SPIE Symposium on Microlithography
Other Authors: Bennett, Marylyn Hoy
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1994]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 2196.
Subjects:
Integrated circuits > Inspection > Congresses.
Integrated circuits > Measurement > Congresses.
Process control > Congresses.
Optical measurements > Congresses.
Description
Item Description:"Papers in this conference ... were presented at the SPIE Microlithography Symposium"--P. ix.
Physical Description:ix, 553 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819414913 (pbk.)