Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SPIE Symposium on Microlithography
Other Authors:	Bennett, Marylyn Hoy
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1994]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 2196.
Subjects:	Integrated circuits > Inspection > Congresses. Integrated circuits > Measurement > Congresses. Process control > Congresses. Optical measurements > Congresses.

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