Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California /
| Corporate Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Wash., USA :
SPIE,
[1994]
|
| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 2194. |
| Subjects: |
| Physical Description: | vii, 420 pages : illustrations ; 28 cm. |
|---|---|
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0819414891 |