Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International
Other Authors:	Patterson, David O.
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1994]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 2194.
Subjects:	Lithography, Electron beam > Congresses. X-ray lithography > Congresses. Ion beam lithography > Congresses. Semiconductors > Etching > Congresses. Masks (Electronics) > Congresses.

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