APA (7th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, & Patterson, D. O. (1994). Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV: 28 February-1 March 1994, San Jose, California. SPIE.

Chicago Style (17th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, and David O. Patterson. Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing IV: 28 February-1 March 1994, San Jose, California. Bellingham, Wash., USA: SPIE, 1994.

MLA (9th ed.) Citation

Society of Photo-optical Instrumentation Engineers, et al. Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing IV: 28 February-1 March 1994, San Jose, California. SPIE, 1994.