Advances in resist technology and processing X : 1-2 March 1993, San Jose, California /

Bibliographic Details
Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Hinsberg, William D.
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1993]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1925.
Subjects:	Photoresistors > Congresses. Photoresists > Congresses.

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