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12th annual Symposium on Photomask Technology : proceedings : 23-24 September 1992, Sunnyvale, California /

Bibliographic Details
Corporate Authors: Symposium on Photomask Technology Sunnyvale, Calif., BACUS (Technical group)
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1993]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 1809.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
Description
Physical Description:ix, 286 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and author index.
ISBN:0819410098 (pbk.)