12th annual Symposium on Photomask Technology : proceedings : 23-24 September 1992, Sunnyvale, California /

Bibliographic Details
Corporate Authors:	Symposium on Photomask Technology Sunnyvale, Calif., BACUS (Technical group)
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1993]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1809.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses.

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