Database for and statistical analysis of the interlaboratory determination of the conversion coefficient for the measurement of the interstitial oxygen content of silicon by infrared absorption /
| Corporate Author: | |
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| Other Authors: | , , |
| Format: | Government Document Book |
| Language: | English |
| Published: |
Gaithersburg, MD :
U.S. Dept. of Commerce, National Institute of Standards and Technology,
[1989]
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| Series: | NIST special publication ;
400-82. Semiconductor measurement technology. |
| Subjects: |
Evans: US Documents (Annex 5th floor)
| Call Number: |
C 13.10: 400-82 |
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| Call Number | Status | Get It |
| C 13.10: 400-82 | Available | |