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Modeling of chemical vapor deposition of tungsten films /

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Bibliographic Details
Main Author: Kleijn, Chris R., 1960-
Other Authors: Werner, Christoph, 1949-
Format: Book
Language:English
Published: Basel ; Boston : Birkhäuser Verlag, 1993.
Series:Progress in numerical simulation for microelectronics ; vol. 2.
Subjects:
Semiconductor films > Mathematical models.
Vapor-plating > Mathematical models.

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Call Number: TK7871.15.F5 K53 1993
 
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TK7871.15.F5 K53 1993 Available