Allison, D. K., Ernst, D. J., McLain, M. E., & Poston, J. W. (1990). The application of channeling to masked ion beam lithography.
Chicago Style (17th ed.) CitationAllison, David Keith, David J. Ernst, Milton E. McLain, and John W. Poston. The Application of Channeling to Masked Ion Beam Lithography. 1990.
MLA (9th ed.) CitationAllison, David Keith, et al. The Application of Channeling to Masked Ion Beam Lithography. 1990.
Warning: These citations may not always be 100% accurate.