The application of channeling to masked ion beam lithography /

Bibliographic Details

Main Author:	Allison, David Keith, 1960-
Other Authors:	Ernst, David J. (degree committee member.), McLain, Milton E. (degree committee member.), Poston, John W. (degree committee member.)
Format:	Thesis Book
Language:	English
Published:	1990.
Subjects:	Channeling (Physics) Ion beam lithography. Nuclear Engineering Academic theses
Online Access:	Link to OAKTrust copy