Electron-beam, x-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, SPIE Symposium on Microlithography
Other Authors:	Peckerar, Martin Charles, 1946-
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1991]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1465.
Subjects:	Lithography, Electron beam > Congresses. X-ray lithography > Congresses. Ion beam lithography > Congresses.

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