Ion beam self annealing in thin silicon films /

Bibliographic Details
Main Author:	Rubio, John David, 1962-
Other Authors:	McLain, Milton E. (degree committee member.), Reuscher, Jon A. (degree committee member.), Watson, Rand L. (degree committee member.)
Format:	Thesis Book
Language:	English
Published:	1990.
Subjects:	Ion bombardment. Lattice dynamics. Silicon oxide films. Major nuclear engineering. Academic theses
Online Access:	ProQuest, Abstract Link to OAKTrust copy

ProQuest, Abstract
Link to OAKTrust copy

Remote Storage

Holdings details from Remote Storage
Call Number	Status	Get It
Call Number:		1990 Dissertation R896
Notes:		Cushing Archival Copy (Library Use Only)

1990 Dissertation R896	Available