X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9-13 July 1990, San Diego, California /
| Corporate Authors: | , |
|---|---|
| Other Authors: | , |
| Format: | Conference Proceeding Book |
| Language: | English |
| Published: |
Bellingham, Wash., USA :
SPIE,
[1991]
|
| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 1343. |
| Subjects: |
| Item Description: | "Part of a three-conference program on x-ray and EUV technologies held at SPIE's International Symposium on Optical and Optoelectronic Applied Science and Engineering, 8-13 July 1990, in San Diego, California."--P. x. |
|---|---|
| Physical Description: | xii, 579 pages : illustrations ; 28 cm. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0819404047 (pbk.) |