X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9-13 July 1990, San Diego, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, International Symposium on Optical & Optoelectronic Applied Science & Engineering
Other Authors:	Hoover, Richard B., Walker, A. B. C.
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1991]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1343.
Subjects:	X-ray optics > Congresses. Ultraviolet radiation > Congresses.

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