Cover Image

Advances in resist technology and processing VI : 27 February-1 March 1989, San Jose, California /

Bibliographic Details
Corporate Author: Society of Photo-optical Instrumentation Engineers
Other Authors: Reichmanis, Elsa, 1953-
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, 1989.
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 1086.
Subjects:
Photoresists > Congresses.
Photoconductivity > Congresses.
Photolithography > Congresses.
Description
Physical Description:viii, 620 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographies and references.
ISBN:0819401218 (pbk.)