Advances in resist technology and processing VI : 27 February-1 March 1989, San Jose, California /

Bibliographic Details
Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Reichmanis, Elsa, 1953-
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, 1989.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1086.
Subjects:	Photoresists > Congresses. Photoconductivity > Congresses. Photolithography > Congresses.

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