Surface and interface analysis of microelectronic materials processing and growth : 12-13 October 1989, Santa Clara, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, North Carolina State University. Center for Advanced Electronic Materials Processing, University of Wisconsin--Madison. Engineering Research Center for Plasma-Aided Manufacturing, SEMATECH (Organization)
Other Authors:	Brillson, L. J., Pollak, Fred H.
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1990]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1186.
Subjects:	Microelectronics > Materials > Congresses. Surfaces (Technology) > Analysis > Congresses. Semiconductors > Materials > Congresses.

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