Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California /
| Corporate Author: | |
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| Other Authors: | |
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Wash., USA :
SPIE,
[1990]
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 1263. |
| Subjects: |
| Physical Description: | viii, 344 pages : illustrations ; 28 cm. |
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| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0819403105 |