Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California /

Bibliographic Details
Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Resnick, Douglas J.
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1990]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1263.
Subjects:	Lithography, Electron beam > Congresses. X-ray lithography > Congresses. Ion beam lithography > Congresses.

Remote Storage