Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California /

Bibliographic Details
Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Yanof, Arnold W.
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : The Society, [1988]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 923.
Subjects:	Lithography, Electron beam > Congresses. X-ray lithography > Congresses. Ion beam lithography > Congresses.
Online Access:	https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0923.toc

Description
Physical Description:	vi, 307 pages : illustrations ; 28 cm.
Bibliography:	Includes bibliographies and index.
ISBN:	089252958X (pbk.)