Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California /
| Corporate Author: | |
|---|---|
| Other Authors: | |
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Wash., USA :
The Society,
[1988]
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 923. |
| Subjects: | |
| Online Access: | https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0923.toc |
Internet
https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0923.tocRemote Storage
| Call Number: |
TK7874 .E4826 1988 |
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|---|---|---|
| Call Number | Status | Get It |
| TK7874 .E4826 1988 | Available | |