Cover Image

Electron-beam, x-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California /

Bibliographic Details
Corporate Author: Society of Photo-optical Instrumentation Engineers
Other Authors: Blais, Phillip D.
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1987]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 773.
Subjects:
Lithography, Electron beam > Congresses.
X-ray lithography > Congresses.
Ion beam lithography > Congresses.
Description
Physical Description:vi, 265 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographies and index.
ISBN:0892528087