Electron-beam, x-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California /

Bibliographic Details
Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Blais, Phillip D.
Format:	Book
Language:	English
Published:	Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1987]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 773.
Subjects:	Lithography, Electron beam > Congresses. X-ray lithography > Congresses. Ion beam lithography > Congresses.

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