Cover Image

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California /

Bibliographic Details
Corporate Authors: International Society for Hybrid Microelectronics, Society of Photo-optical Instrumentation Engineers
Other Authors: Wagner, Alfred
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1984]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 471.
Subjects:
Photoresists > Congresses.
Photolithography > Congresses.
Description
Physical Description:vi, 136 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0892525061 (pbk.)