Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California /

Bibliographic Details
Corporate Authors:	International Society for Hybrid Microelectronics, Society of Photo-optical Instrumentation Engineers
Other Authors:	Wagner, Alfred
Format:	Book
Language:	English
Published:	Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1984]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 471.
Subjects:	Photoresists > Congresses. Photolithography > Congresses.

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