APA (7th ed.) Citation

International Society for Hybrid Microelectronics, Society of Photo-optical Instrumentation Engineers, & Wagner, A. (1984). Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III: March 15-16, 1984, Santa Clara, California. SPIE--the International Society for Optical Engineering.

Chicago Style (17th ed.) Citation

International Society for Hybrid Microelectronics, Society of Photo-optical Instrumentation Engineers, and Alfred Wagner. Electron-beam, X-ray, and Ion-beam Techniques for Submicrometer Lithographies III: March 15-16, 1984, Santa Clara, California. Bellingham, Wash.: SPIE--the International Society for Optical Engineering, 1984.

MLA (9th ed.) Citation

International Society for Hybrid Microelectronics, et al. Electron-beam, X-ray, and Ion-beam Techniques for Submicrometer Lithographies III: March 15-16, 1984, Santa Clara, California. SPIE--the International Society for Optical Engineering, 1984.