Optical microlithography III : technology for the next decade, March 14-15, 1984, Santa Clara, California /

Bibliographic Details
Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Stover, Harry L.
Format:	Book
Language:	English
Published:	Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1984]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 470.
Subjects:	Photolithography > Congresses. Integrated circuits > Very large scale integration > Congresses.

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