Advances in resist technology : March 12-13, 1984, Santa Clara, California /

Bibliographic Details
Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Willson, C. G. (C. Grant), 1939-
Format:	Book
Language:	English
Published:	Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 1984.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 469.
Subjects:	Photoresists > Congresses. Lithography > Congresses. Microelectronics > Congresses.

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