Optical microlithography II : technology for the 1980s, March 16-17, 1983, Santa Clara, California /

Bibliographic Details
Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Stover, Harry L.
Format:	Book
Language:	English
Published:	Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1983]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 394.
Subjects:	Photolithography > Congresses. Integrated circuits > Very large scale integration > Congresses.

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